HKUST Library Institutional Repository Banner

HKUST Institutional Repository >
Physics >
PHYS Journal/Magazine Articles >

Please use this identifier to cite or link to this item: http://hdl.handle.net/1783.1/2370
Title: Time dependent tunneling spectroscopy for studying surface diffusion confined in nanostructures
Authors: Wang, Kedong
Zhang, Chun
Loy, Michael M.
Xiao, Xudong
Keywords: Silicon
Elemental semiconductors
Surface diffusion
Scanning tunnelling microscopy
Nanostructured materials
Issue Date: 25-Jan-2005
Citation: Physical review letters, v. 94, p. 036103, 2005
Abstract: By confining a diffusion atom in a nanometer region using surface potential heterogeneity, we have successfully employed a time-dependent tunneling spectroscopy to quantitatively study its random motion. A hopping rate in the range of 1-104 Hz, ~3 orders of magnitude faster than those accessible by the existing diffusion methods based on scanning tunneling microscopy, was demonstrated for single Cu atoms diffusing in the faulted half unit cell of Si(111)7x7. Our technique is potentially useful to detect fast diffusion processes such as H quantum diffusion at atomic scale.
Rights: Phys. Rev. Lett. © copyright (2005) American Physical Society. The Journal's web site is located at http://prl.aps.org/
URI: http://hdl.handle.net/1783.1/2370
Appears in Collections:PHYS Journal/Magazine Articles
INST Journal/Magazine Articles

Files in This Item:

File Description SizeFormat
KedongPRLrev2.pdfpre-published version248KbAdobe PDFView/Open

Find published version via OpenURL Link Resolver

All items in this Repository are protected by copyright, with all rights reserved.