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Please use this identifier to cite or link to this item:
http://hdl.handle.net/1783.1/400
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| Title: | Method of manufacturing photo-alignment layer |
| Authors: | Yip, Wing C.
Prudnikova, Elena K.
Kwok, Hoi-Sing
Chigrinov, Vladimir G.
Kozenkov, Vladimir M.
Takada, Hirokazu
Fukuda, Masanobu |
| Keywords: | Photo-alignment layer
Dichroic dye
Polymerizable groups |
| Issue Date: | 24-Jun-2003 |
| Citation: | US Patent 6,582,776. Washington, DC: US Patent and Trademark Office, 2003. |
| Abstract: | A photo-alignment layer having excellent long-term stability to light and heat is manufactured by coating a material for the photo-alignment layer, which contains a dichroic dye having two or more polymerizable groups per molecule, on a substrate, and exposing the coating layer to polarized light, thereby imparting a photo-alignment function, and polymerizing the polymerizable groups by heating or light exposure. |
| URI: | http://hdl.handle.net/1783.1/400 |
| Appears in Collections: | ECE Patents
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Files in This Item:
| File |
Description |
Size | Format |
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| US6582776.pdf | | 858Kb | Adobe PDF | View/Open |
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