HKUST Library Institutional Repository Banner

HKUST Institutional Repository >
Physics >
PHYS Master Theses  >

Please use this identifier to cite or link to this item: http://hdl.handle.net/1783.1/5361
Title: Kinetics of etching in faceted surfaces
Authors: Wong, Suk Mei
Issue Date: 1998
Abstract: Recently, the kinetics of surface roughening has attracted a lot of attention in statistical physics. For many systems, the roughness is characterized by the roughness exponent and the dynamic exponent. We proposed a model of surface etching which includes the effects of impurity pinning. For 1 dimension, computer simulations showed that when the etching process initiates from the vertices of mesoscopic size (such as in faceted surfaces like quantum dots), the dynamic exponents is 1.331 +- 0.018 for sparsely pinned region, 1.070 +- 0.014 for densley pinned region. These dynamic dynamic exponents are different from the resuils of 1.528 ± 0.016 obtained by starting from a smooth surface, which the KPZ expect at ion is applicable to. We have also investigated the etching process of model with different initial pyramid sizes, and found that the evolution of roughness can be considered as the superposition of 2 processes: evolution of the entire substrate surface, and that of a single pyramid.
Description: Thesis (M.Phil.)--Hong Kong University of Science and Technology, 1998
xi, 52 leaves : ill. ; 30 cm
HKUST Call Number: Thesis PHYS 1998 WongSM
URI: http://hdl.handle.net/1783.1/5361
Appears in Collections:PHYS Master Theses

Files in This Item:

File Description SizeFormat
th_redirect.html0KbHTMLView/Open

All items in this Repository are protected by copyright, with all rights reserved.