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Please use this identifier to cite or link to this item: http://hdl.handle.net/1783.1/6267
Title: Defect formation and annealing behaviors of fluorine-implanted GaN layers revealed by positron annihilation spectroscopy
Authors: Wang, Maojun
Yuan, Li
Cheng, C. C.
Beling, C. D.
Chen, Kevin J.
Keywords: Fluorine ions
GaN
Fluorine implantation
Defect formation
Issue Date: Feb-2009
Citation: Applied physics letters, v. 94, 061910 (2009)
Abstract: Defect formation and annealing behaviors of fluorine-implanted, unintentionally doped GaN layers were studied by positron annihilation spectroscopy (PAS). Single Ga vacancies (VGa) were identified as the main vacancy-type defects detected by PAS after fluorine implantation at 180 keV with a dose of 1×1015 cm-2. Implantation-induced VGa tend to aggregate and form vacancy clusters after postimplantation annealing in N2 ambient at 600 °C. Fluorine ions tend to form F-vacancy complexes quickly after thermal annealing, which is consistent with the proposed diffusion model that predicts the behaviors of fluorine in GaN.
Rights: Copyright 2009 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Applied Physics Letters and may be found at http://apl.aip.org/
URI: http://hdl.handle.net/1783.1/6267
Appears in Collections:ECE Journal/Magazine Articles

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