|
HKUST Institutional Repository >
Electronic and Computer Engineering >
ECE Patents >
Please use this identifier to cite or link to this item:
http://hdl.handle.net/1783.1/6441
|
| Title: | 一种透反式液晶器件及其制备方法 |
| Authors: | Kwok, Hoi-Sing (郭海成) Wong, Man (王文) Meng, Zhiguo (孟志國) |
| Keywords: | Nickel Crystallization Amorphous silicon transflective Electrode |
| Issue Date: | 24-Feb-2010 |
| Citation: | 中國專利 ZL 200580049823.2 |
| Abstract: | 本发明描述电极的构建用于液晶显示器,该显示器采用一种在可见光谱区显示吸收性低于20% 的大晶粒低吸收多晶硅,本发明显示制备有源矩阵的衬底,薄膜晶体管的源极、漏极及沟道区和象素电极是相连地形成多硅单层。 |
| Rights: | This patent is also available at HKUST Technology Transfer Center Patent Search at <http://patentsearch.ttc.ust.hk/ListPatentsDetail.asp?id=584> |
| URI: | http://hdl.handle.net/1783.1/6441 |
| Appears in Collections: | ECE Patents
|
Files in This Item:
| File |
Description |
Size | Format |
| ZL2005800498232.pdf | | 2755Kb | Adobe PDF | View/Open |
|
All items in this Repository are protected by copyright, with all rights reserved.
|