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| Title: | Fabrication and characterization of horizontally aligned carbon nanotubes for interconnect application |
| Authors: | Chai, Yang Xiao, Zhiyong Chan, Philip Ching-Ho |
| Keywords: | Carbon nanotubes Polysilicon structure Silicon oxide Electrical property Scaling effect Interconnect line |
| Issue Date: | May-2009 |
| Citation: | Proceedings 59th Electronic Components and Technology Conference, 2009. ECTC 2009, San Diego, CA, USA, 26-29 May 2009, p. 1465-1469 |
| Abstract: | We discuss the use of electron-shading effect during the plasma-enhanced chemical vapor deposition to control the growth of carbon nanotubes (CNTs). We designed and fabricated the trench and island test structures. The horizontally aligned CNTs were grown from the sidewall of the polysilicon structure, parallel to the silicon oxide surface. We investigated the electrical property of the CNT number for the interconnect line application. We also studied the scaling effect of the CNT number. This approach provides a method to implement complex CNT structure by in-stiu growth, and integrate them to realize various electrical devices and interconnect lines. |
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| URI: | http://hdl.handle.net/1783.1/6580 |
| Appears in Collections: | ECE Conference Papers
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