Please use this identifier to cite or link to this item: http://hdl.handle.net/1783.1/1240

Ion implantation of MeV Au+ into potassium titanyl phosphate

Authors Wang, KM
Shi, BR
Cue, N
Lu, F
Meng, MQ
Hu, H
Shen, DY
Liu, YG
Fink, D
Muller, M
Issue Date 2001
Source Journal OF PHYSICS d-applied PHYSICS , v. 34, (11), 2001, JUN 7, p. 1569-1574
Summary Potassium titanyl phosphate (KTiOPO4 or KTP) was implanted with 1.0 MeV Au+ ions to a fluence of 5 x 10(15) ions cm(-2) at room temperature under different angles of incidence. The longitudinal and lateral range profiles, diffusion, damage, surface morphology and structure have been studied by Rutherford backscattering (RBS)/channelling, scanning electron microscopy (SEM) and x-ray diffraction. The results show that(l) the experimental mean projected range is larger than the value predicted by TRIM (transport of ions in matter) by about 15\%; (2) the experimental range straggling and lateral spread deviate from the TRIM predictions by around 50 and 20\%, respectively; (3) the crystal is completely amorphized in the damaged region; (4) the implanted gold in KTiOPO4 is stable against annealing at 700 degreesC, but diffusion takes place at and above 800 degreesC; (5) the surface morphology is different for virgin and Au+ implanted KTiOPO4.
Subjects
ISSN 0022-3727
Rights Journal of Physics D: Applied Physics © copyright (2001) IOP Publishing Ltd. The Journal's web site is located at http://www.iop.org/EJ/Journal/JPhysD
Language English
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