Please use this identifier to cite or link to this item: http://hdl.handle.net/1783.1/20554

Effect of plasma treatment on surface properties of TiO2 nanoparticulate films

Authors Cao, Yaán
Meng, Qingjiu
Yang, Wensheng
Yao, Jianghong
Shu, Yongchun
Wang, Wei
Chen, Guohua View this author's profile
Issue Date 2005
Source Colloids and Surfaces a-physicochemical and engineering ASPECTS , v. 262, (1-3), 2005, JUL 15, p. 181-186
Summary TiO2 nanoparticle films were prepared by plasma-enhanced chemical vapor deposition, and subsequently, their surfaces were treated by TiCl4 and O-2 plasmas, respectively. Experiments of phenol photodegradation show that the TiO2 film treated by O-2 plasma presents much higher photocatalytic activity than that treated by TiCl4 plasma. X-ray photoelectron spectral analyses indicate that more active species, such as O-2, are formed on surface of the film treated by O-2 plasma than that treated by TiCl4 plasma. The energy levels of the surface species and the photogenerated electronic transitions via these surface species are further investigated by surface photovoltage spectra (SPS) and electric field-induced surface photovoltage spectra (EFISPS). (c) 2005 Elsevier B.V. All rights reserved.
Subjects
ISSN 0927-7757
Language English
Format Article
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