Please use this identifier to cite or link to this item: http://hdl.handle.net/1783.1/2440

A new system design for the preparation of copper/activated carbon catalyst by metal-organic chemical vapor deposition method

Authors Lam, FLY
Hu, XJ
Issue Date 2003
Source Chemical engineering science, v. 58, (3-6), 2003, FEB-MAR, p. 687-695
Summary A metal-organic chemical vapor deposition (MOCVD) technique was used to prepare heterogeneous metallic catalyst supported on activated carbon. A new system design was built to achieve higher metal loading within a shorter preparation time. In the optimization of system parameters, higher metal loading can be achieved by using longer deposition time, optimum carrier gas flow rate, higher operating temperature of either evaporation zone or a deposition zone or a smaller amount of porous support. Several techniques were carried out to characterize the catalyst such as physisorption, X-ray diffraction, inductively coupled plasma-optical emission spectroscopy and scanning electronic microscopy assisted with the Energy dispersive X-ray spectroscopy (SEM-EDX). It was found that the BET specific surface area and total adsorption volume of the prepared catalysts were reduced after metal deposition, due to the formation of the deposited copper onto the porous media both externally and internally. The morphology of the cylindrical Cu/AC was analyzed by SEM-EDX. The results show that the metal was deposited with a reasonably uniform distribution onto the inner part of the porous support. (C) 2003 Elsevier Science Ltd. All rights reserved.
Subjects
ISSN 0009-2509
Rights Chemical Engineering Science © copyright (2003) Elsevier. The Journal's web site is located at http://www.sciencedirect.com/
Language English
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