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A method of forming solder bumps for flip chip

Authors Chan, Philip Ching-Ho (陳正豪)
Xiao, Guo Wei (肖國偉)
Issue Date 2006-11-08
Source 中國專利, ZL 03142416.3
Summary A method for the fine-pitch stencil mask design for stencil printing bumping technology for eutectic Sn/Pb and lead-free solder material is described. In the method, a reflowing enhancement layer is introduced to improve the solder quality and reduce the pitch of solder bumps. The method of forming the layer is described as well as the forming method of matching under-bump metallurgy layer. The method of stencil mask design can match various sizes and pitch of the solder bumps. The designed mask is fixed on the stencil printer to deposit the solder materials with the required patterns. This method can increase the solder paste volume to increase the height of solder bumps after the reflowing process.
Language English
Format Patent
Access View details via HKUST Technology Transfer Center Patent Search
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[CN]ZL03142416.3(TTC.PA.0212)_20061205.pdf 224426 B Adobe PDF