Please use this identifier to cite or link to this item: http://hdl.handle.net/1783.1/400

Method of manufacturing photo-alignment layer

Authors Yip, Wing C.
Prudnikova, Elena K.
Kwok, Hoi-Sing
Chigrinov, Vladimir G.
Kozenkov, Vladimir M.
Takada, Hirokazu
Fukuda, Masanobu
Issue Date 2003-06-24
Source US Patent, 6,582,776. Washington, DC: US Patent and Trademark Office, 2003.
Summary A photo-alignment layer having excellent long-term stability to light and heat is manufactured by coating a material for the photo-alignment layer, which contains a dichroic dye having two or more polymerizable groups per molecule, on a substrate, and exposing the coating layer to polarized light, thereby imparting a photo-alignment function, and polymerizing the polymerizable groups by heating or light exposure.
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Language English
Format Patent
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