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Two-photon fabrication of photonic crystals by single-beam laser holographic lithography

Authors Zhong, Yongchun HKUST affiliated (currently or previously)
Zhou, Jianying HKUST affiliated (currently or previously)
Wong, Kam Sing View this author's profile
Issue Date 2010
Source Journal of applied physics , v. 107, (7), 2010, APR 1, article number 074311
Summary We demonstrate a novel approach for the easy fabrication of photonic crystals (PCs) with arbitrary optical lattice using two-photon holographic lithography (HL). The quadratic dependence of the two-photon absorption process dramatically increases the contrast of the pattern and the low absorption coefficient of the photoresist at 720 nm lead to a high aspect ratio and low fluctuation of the pattern. By applying such a technique, defect-free and highly uniform one-dimensional gratings, two-dimensional quasicrystals, and three-dimensional (3D) face center cube-type PCs of high aspect ratio and small filling factor are obtained. This two-photon based HL technique is particularly suitable for making 3D PCs and quasicrystals with complex and fine structural details. (C) 2010 American Institute of Physics. [doi:10.1063/1.3374476]
ISSN 0021-8979
Rights Copyright 2010 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Journal of Applied Physics and may be found at
Language English
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