Please use this identifier to cite or link to this item: http://hdl.handle.net/1783.1/6675

Thin Photo-Patterned Micropolarizer Array for CMOS Image Sensors

Authors Zhao, Xiaojin
Boussaid, Farid
Bermak, Amine
Chigrinov, Vladimir G.
Issue Date 2009
Source IEEE photonics technology letters, v. 21, (9-12), 2009, MAY-JUN, p. 805-807
Summary We fabricated and characterized a thin photo-patterned micropolarizer array for complementary metal-oxide-semiconductor (CMOS) image sensors. The proposed micropolarizer fabrication technology completely removes the need for complex selective etching. Instead, it uses the well-controlled process of ultraviolet photolithography to define micropolarizer orientation patterns on a spin-coated azo-dye-1 film. The patterned polymer film micropolarizer (10 mu m x 10 mu m) exhibits submicron thickness (0.3 mu m) and has an extinction ratio of similar to 100. Reported experimental results validate the concept of a thin, high spatial resolution, low-cost photo-patterned micropolarizer array for CMOS image sensors.
Subjects
ISSN 1041-1135
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Language English
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